During the past two years the new process simulator MIMAS lias been developed at SIEMENS which is able to handle completely general 2D structures and which integrates the most relevant process steps like etching,deposition, local oxidation, ion implantation and dopand difTusion in a transparent way to a, proccss-CADsystem. In this paper the structural simulation part of MIMAS will be presented, general system aspects and the simulation capabilities for implantation and diffusion have been discussed in [l].     «

During the past two years the new process simulator MIMAS lias been developed at SIEMENS which is able to handle completely general 2D structures and which integrates the most relevant process steps like etching,deposition, local oxidation, ion implantation and dopand difTusion in a transparent way to a, proccss-CADsystem. In this paper the structural simulation part of MIMAS will be presented, general system aspects and the simulation capabilities for implantation and diffusion have been discus...     »