User: Guest  Login
If you experience problems opening the document, please try this link.
Document type:
Zeitschriftenaufsatz
Author(s):
Henning, Alex; Bartl, Johannes D.; Zeidler, Andreas; Qian, Simon; Bienek, Oliver; Jiang, Chang‐Ming; Paulus, Claudia; Rieger, Bernhard; Stutzmann, Martin; Sharp, Ian D.
Title:
Aluminum Oxide at the Monolayer Limit via Oxidant‐Free Plasma‐Assisted Atomic Layer Deposition on GaN
Journal title:
Advanced Functional Materials
Year:
2021
Pages contribution:
2101441
Fulltext / DOI:
doi:10.1002/adfm.202101441
Publisher:
Wiley
E-ISSN:
1616-301X1616-3028
Date of publication:
12.06.2021
 BibTeX