- Autor(en):
- VEPREK, S; VEPREKHEIJMAN, MGJ; AMBACHER, O; al., et
- Titel:
- MECHANISMS AND RATE DETERMINING STEPS IN PLASMA INDUCED HIGH-RATE CVD OF SILICON AND GERMANIUM - SIMILARITIES AND DIFFERENCES
- Zeitschriftentitel:
- JOURNAL DE PHYSIQUE III
- Jahr:
- 1992
- Band / Volume:
- 2
- Heft / Issue:
- 8
- Seitenangaben Beitrag:
- 1431-1438
- BibTeX